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INTERNATIONAL JOURNAL OF PHARMACEUTICAL RESEARCH

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Published by : Advanced Scientific Research
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0975-2366
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IJPR 9[3] July - September 2017 Special Issue

July - September 9[3] 2017

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Evaluation of Novel 3,4-Dimethoxychalcone Activity as a Photoprotective Agent Against Ultraviolet A (UVA) In Vitro in Gel and Microemulgel Dosage Forms

Author: RIZA MAULANA, ABDUL KARIM ZULKARNAIN, RINA KUSWAHYUNING
Abstract: The 3,4-Dimethoxychalcone (3,4-DC) is a derivative chalcone compound considered to have potency as a protection agent against ultraviolet exposure. Ultraviolet A (UV-A) is one of the UV ray components that could damage the skin and has a more destructive effect than Ultraviolet B (UV-B). The purpose of this research was to evaluate the activity of 3,4-DC as a protection agent in protecting the skin from UV-A exposure. The parameters are percent transmission of erythema (%TE) and percent transmission of pigmentation (%TP), UVA Protection Factor (UVA-PF) in vitro, and also to know photostability phenomena due to UV-A exposure. All determinations in this research were conducted based on UV-Vis spectrophotometry. Determination of %TE and %TP were conducted using Cumpelik’s method. Determination of UV-A PF in vitro value was done by the Diffey-Robson method, while UV-A exposure was done with ultraviolet radiation (UVR) simulator. Photostability of 3,4-DC was observed based on spectra UV before and after UVA exposure. Results showed that %TE and %TP HPMC gel preparation has the least %TP value (23,64%) which signifies the best protection, then subsequently microemulgel HPMC (26,00%), gel CMC-Na (31,89%), and microemulgel CMC-Na (44,12%). In vitro UV-A exposure tests obtained the highest UVA-PF values was HPMC microemulgel (2,72), then subsequently HPMC gel (2,33), CMC-Na microemulgel (1,17), and CMC-Na gel (1,10). Meanwhile, UV spectra shift occurred in all preparations due to exposure to UV-A rays.
Keyword: 3,4-Dimethoxychalcone, %TE dan %TP, UV-A Protection Factor, spectra shift.
DOI: https://doi.org/10.31838/ijpr/2021.13.02.193
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