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Photostabilization of Poly Styrene (Ps) Films with Different Complexes Derived from Various Shif Bases
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| Author:
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AMIR DAWOOD, MUSTAFA NAJIM ABD OUN
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| Abstract:
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This study, included photo stabilization of polystyrene films after exposing them to light using complexes derived from different Schiff' bases with Ni+2 and series of coordination complexes of Mn+2 ,Fe+2,Co+2,Ni+2,Cu+2 andZn+2 with {bis (Salicylaldyhyde) diimininato) as additives. Polystyrene films with a thickness of 80 µm and contains complex concentration of 0.05% wt were produced by casting method from chloroform solvent. The specimens (films) were irradiated for different times at wavelength (313nm) at 25°C. The photo stabilization activities of these complexes were determined by monitoring changes in carbonyl,(ICO) and hydroxyl , (IOH) indices by using FTIR ,and Ultraviolet-visible (UV-Vis) was used to calculate the rate of degradation, weight loss, molecular weight viscosity, scission of polymeric chain(S) and degree of dissociation(a) . The results indicated that the synthesized complexes have worked as photo stabilizers for poly styrene. So the complexes were able to endow excellent protection to polystyrene against ultraviolet irradiation. The results obtained showed that the photostabilization activity of polystyrene film in the presence of complexes as additive follows the trends:( Zn-L1 < Cu-L1< Ni-L1< PS Pure)and (Co-L1 < Mn-L1 < Fe-L1
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| Keyword:
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Polystyrene, photo stabilization, Schiff base complexes, Carbonyl index, Hydroxyl index, weight loss.
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| EOI:
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-
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| DOI:
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https://doi.org/10.31838/ijpr/2020.12.03.127
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| Download:
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